Fabrication and characterization of buried-gate fin and recess channel MOSFET for high performance and low GIDL current

التفاصيل البيبلوغرافية
العنوان: Fabrication and characterization of buried-gate fin and recess channel MOSFET for high performance and low GIDL current
المؤلفون: Song, Jae Young, Kim, Jong Pil, Kim, Sang Wan, Oh, Jeong-Hoon, Ryoo, Kyung-Chang, Sun, Min-Chul, Kim, Garam, Kim, Hyun Woo, Chang, Jisoo, Jung, Sunghun, Shin, Hyungcheol, Park, Byung-Gook
المصدر: 2009 International Semiconductor Device Research Symposium Semiconductor Device Research Symposium, 2009. ISDRS '09. International. :1-2 Dec, 2009
Relation: 2009 International Semiconductor Device Research Symposium (ISDRS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424460304
9781424460311
DOI:10.1109/ISDRS.2009.5378069