دورية أكاديمية
Sharp Reduction of Contact Resistivities by Effective Schottky Barrier Lowering With Silicides as Diffusion Sources
| العنوان: | Sharp Reduction of Contact Resistivities by Effective Schottky Barrier Lowering With Silicides as Diffusion Sources |
|---|---|
| المؤلفون: | Zhang, Z., Pagette, F., D'Emic, C., Yang, B., Lavoie, C., Zhu, Y., Hopstaken, M., Maurer, S., Murray, C., Guillorn, M., Klaus, D., Bucchignano, J., Bruley, J., Ott, J., Pyzyna, A., Newbury, J., Song, W., Chhabra, V., Zuo, G., Lee, K-L., Ozcan, A., Silverman, J., Ouyang, Q., Park, D-G., Haensch, W., Solomon, P. M. |
| المصدر: | IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 31(7):731-733 Jul, 2010 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 07413106 15580563 |
|---|---|
| DOI: | 10.1109/LED.2010.2048992 |