التفاصيل البيبلوغرافية
العنوان: |
Measuring SADP features of the 22nm technology node with old generation CD SEMs |
المؤلفون: |
James Jiahua Yu, Bencher, Chris, Xumou Xu, Yongmei Chen, Huixiong Dai, Harel, Opher, Jin, Jaklyn, Berger, Ami, Peltinov, Ram |
المصدر: |
2008 International Symposium on Semiconductor Manufacturing (ISSM) Semiconductor Manufacturing (ISSM), 2008 International Symposium on. :69-71 Oct, 2008 |
Relation: |
2008 IEEE International Symposium on Semiconductor Manufacturing (ISSM) |
قاعدة البيانات: |
IEEE Xplore Digital Library |