مؤتمر
Aggressively scaled high-k last metal gate stack with low variability for 20nm logic high performance and low power applications
| العنوان: | Aggressively scaled high-k last metal gate stack with low variability for 20nm logic high performance and low power applications |
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| المؤلفون: | Hyun, S., Han, J.-H., Park, H.-B., Na, H.-J., Son, H.J., Lee, H.Y., Hong, H.-S., Lee, H.-L., Song, J., Kim, J.J., Lee, J., Jeong, W.C., Cho, H.J., Seo, K.I., Kim, D.W., Sim, S.P., Kang, S.B., Sohn, D.K., Choi, Siyoung, Kang, Hokyu, Chung, Chilhee |
| المصدر: | 2011 Symposium on VLSI Technology - Digest of Technical Papers VLSI Technology (VLSIT), 2011 Symposium on. :32-33 Jun, 2011 |
| Relation: | 2011 IEEE Symposium on VLSI Technology |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424499496 9784863481664 |
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| تدمد: | 07431562 21589682 |