Wafer by Wafer Low Dose Rate Qualification in a Production Environment

التفاصيل البيبلوغرافية
العنوان: Wafer by Wafer Low Dose Rate Qualification in a Production Environment
المؤلفون: van Vonno, N. W., Pearce, L. G., Northen, A. L., Touvell, J. R., Brewster, J. C., Gill, J. S., Thomson, E. T., Chesley, P. J., Schettler, D.
المصدر: 2011 IEEE Radiation Effects Data Workshop Radiation Effects Data Workshop (REDW), 2011 IEEE. :1-7 Jul, 2011
Relation: 2011 IEEE Radiation Effects Data Workshop (in conjunction with NSREC 2011)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781457712814
تدمد:21540519
21540535
DOI:10.1109/REDW.2010.6062512