Modeling the effect of carbon on boron diffusion

التفاصيل البيبلوغرافية
العنوان: Modeling the effect of carbon on boron diffusion
المؤلفون: Rucker, H., Heinemann, B., Ropke, W., Fischer, G., Lippert, G., Osten, H.J., Kurps, R.
المصدر: SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest Simulation of semiconductor processes and devices Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on. :281-284 1997
Relation: SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780337751
9780780337756
DOI:10.1109/SISPAD.1997.621392