مؤتمر
Modeling the effect of carbon on boron diffusion
العنوان: | Modeling the effect of carbon on boron diffusion |
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المؤلفون: | Rucker, H., Heinemann, B., Ropke, W., Fischer, G., Lippert, G., Osten, H.J., Kurps, R. |
المصدر: | SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest Simulation of semiconductor processes and devices Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on. :281-284 1997 |
Relation: | SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780337751 9780780337756 |
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DOI: | 10.1109/SISPAD.1997.621392 |