The optimization of in-line scanner defect sizing using a circuit's layout and critical area

التفاصيل البيبلوغرافية
العنوان: The optimization of in-line scanner defect sizing using a circuit's layout and critical area
المؤلفون: Lee, A., Milor, L., Yung-Tao Lin
المصدر: 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings Advanced semiconductor manufacturing Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI. :78-83 1997
Relation: 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780340507
9780780340503
تدمد:10788743
DOI:10.1109/ASMC.1997.630710