مؤتمر
An experimental study on channel backscattering in high-k/metal gate nMOSFETs
| العنوان: | An experimental study on channel backscattering in high-k/metal gate nMOSFETs |
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| المؤلفون: | Sagong, Hyun Chul, Kang, Chang Yong, Sohn, Chang-Woo, Jeong, Eui-Young, Choi, Do-Young, Lee, Sang-Hyun, Kim, Ye-Ram, Jang, Jun-Woo, Jeong, Yoon-Ha |
| المصدر: | 2012 IEEE International Integrated Reliability Workshop Final Report Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International. :171-174 Oct, 2012 |
| Relation: | 2012 IEEE International Integrated Reliability Workshop (IIRW) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781467327497 9781467327510 9781467327527 |
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| تدمد: | 19308841 23748036 |
| DOI: | 10.1109/IIRW.2012.6468948 |