مؤتمر
Uniformity control for high selective down-flow plasma etching on silicon oxide
| العنوان: | Uniformity control for high selective down-flow plasma etching on silicon oxide |
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| المؤلفون: | Fang-Hao Hsu, Kuo-Feng Lo, Xin-Guan Lin, Han-Hui Hsu, Yuan-Chieh Chiu, Hong-Ji Lee, Nan-Tzu Lian, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu |
| المصدر: | 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI. :242-244 May, 2014 |
| Relation: | 2014 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781479939442 |
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| تدمد: | 10788743 23766697 |
| DOI: | 10.1109/ASMC.2014.6847006 |