دورية أكاديمية
Influence of Ar and N2 Pressure on Plasma Chemistry, Ion Energy, and Thin Film Composition During Filtered Arc Deposition From Ti3SiC2 Cathodes
| العنوان: | Influence of Ar and N2 Pressure on Plasma Chemistry, Ion Energy, and Thin Film Composition During Filtered Arc Deposition From Ti3SiC2 Cathodes |
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| المؤلفون: | Eriksson, A.O., Mraz, S., Jensen, J., Hultman, L., Zhirkov, I., Schneider, J.M., Rosen, J. |
| المصدر: | IEEE Transactions on Plasma Science IEEE Trans. Plasma Sci. Plasma Science, IEEE Transactions on. 42(11):3498-3507 Nov, 2014 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 00933813 19399375 |
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| DOI: | 10.1109/TPS.2014.2361867 |