مؤتمر
Advanced 0.25-0.18 /spl mu/m fully-planarized 6-level-interconnect CMOS technology for foundry manufacturing
| العنوان: | Advanced 0.25-0.18 /spl mu/m fully-planarized 6-level-interconnect CMOS technology for foundry manufacturing |
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| المؤلفون: | Lin, T., Chen, C., Hsu, S.Y., Tsai, M.J., Yew, T.R., Chou, J.W., Huang, K.T., Wu, J.Y., Ku, Y.C., Liu, C.C., Yang, M.S., Yeh, W.K., Huang, C.H., Lur, W., Huang, H.S., Sun, S.W. |
| المصدر: | 1998 Semiconductor Manufacturing Technology Workshop (Cat. No.98EX133) Semiconductor manufacturing technology Semiconductor Manufacturing Technology Workshop, 1998. :57-60 1998 |
| Relation: | 1998 Semiconductor Manufacturing Technology Workshop |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780351797 9780780351790 |
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| DOI: | 10.1109/SMTW.1998.722651 |