High performance poly Si junctionless transistors with sub-5nm conformally doped layers by molecular monolayer doping and microwave incorporating CO2 laser annealing for 3D stacked ICs applications

التفاصيل البيبلوغرافية
العنوان: High performance poly Si junctionless transistors with sub-5nm conformally doped layers by molecular monolayer doping and microwave incorporating CO2 laser annealing for 3D stacked ICs applications
المؤلفون: Lee, Yao-Jen, Cho, Ta-Chun, Sung, Po-Jung, Kao, Kuo-Hsing, Hsueh, Fu-Kuo, Hou, Fu-Ju, Chen, Po-Cheng, Chen, Hsiu-Chih, Wu, Chien-Ting, Hsu, Shu-Han, Chen, Yi-Ju, Huang, Yao-Ming, Hou, Yun-Fang, Huang, Wen-Hsien, Yang, Chih-Chao, Chen, Bo-Yuan, Lin, Kun-Lin, Chen, Min-Cheng, Shen, Chang-Hong, Huang, Guo-Wei, Huang, Kun-Ping, Current, Michael I., Li, Yiming, Samukawa, Seiji, Wu, Wen-Fa, Shieh, Jia-Min, Chao, Tien-Sheng, Yeh, Wen-Kuan
المصدر: 2015 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2015 IEEE International. :6.2.1-6.2.4 Dec, 2015
Relation: 2015 IEEE International Electron Devices Meeting (IEDM)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781467398947
9781467398930
تدمد:2156017X
DOI:10.1109/IEDM.2015.7409638