Fluorine-free tungsten films as low resistance liners for tungsten fill applications

التفاصيل البيبلوغرافية
العنوان: Fluorine-free tungsten films as low resistance liners for tungsten fill applications
المؤلفون: Bakke, Jonathan, Yu Lei, Yi Xu, Daito, Kazuya, Xinyu Fu, Guoqiang Jian, Kai Wu, Raymond Hung, Jakkaraju, Rajkumar, Breil, Nicolas
المصدر: 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2016 IEEE International. :108-110 May, 2016
Relation: 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781509003860
9781509003853
تدمد:23806338
DOI:10.1109/IITC-AMC.2016.7507699