مؤتمر
Fluorine-free tungsten films as low resistance liners for tungsten fill applications
| العنوان: | Fluorine-free tungsten films as low resistance liners for tungsten fill applications |
|---|---|
| المؤلفون: | Bakke, Jonathan, Yu Lei, Yi Xu, Daito, Kazuya, Xinyu Fu, Guoqiang Jian, Kai Wu, Raymond Hung, Jakkaraju, Rajkumar, Breil, Nicolas |
| المصدر: | 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2016 IEEE International. :108-110 May, 2016 |
| Relation: | 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
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