مؤتمر
Edge FN stress induced leakage current in tunnel oxides
| العنوان: | Edge FN stress induced leakage current in tunnel oxides |
|---|---|
| المؤلفون: | Nian-Kai Zous, Yeh, C.C., Tsai, C.W., Chiang, L.P., Tahui Wang |
| المصدر: | 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) VLSI technology, systems, and applications VLSI Technology, Systems, and Applications, 1999. International Symposium on. :262-265 1999 |
| Relation: | Proceedings of International Symposium on VLSI Technology Systems and Applications |
| قاعدة البيانات: | IEEE Xplore Digital Library |
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