دورية أكاديمية
Perfluorocompound Emissions Control and Kinetic Characteristics in Point-of-Use Wet-Thermal-Wet Abatement of Plasma-Enhanced Chemical Vapor Deposition Chamber Cleaning
| العنوان: | Perfluorocompound Emissions Control and Kinetic Characteristics in Point-of-Use Wet-Thermal-Wet Abatement of Plasma-Enhanced Chemical Vapor Deposition Chamber Cleaning |
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| المؤلفون: | Hu, S., Shiue, A., Tseng, W., Leggett, G. |
| المصدر: | IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 31(2):302-308 May, 2018 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 08946507 15582345 |
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| DOI: | 10.1109/TSM.2018.2808173 |