التفاصيل البيبلوغرافية
| العنوان: |
A systematic study of gate dielectric TDDB in FinFET technology |
| المؤلفون: |
Kim, Hyunjin, Jin, Minjung, Sagong, Hyunchul, Kim, Jinju, Jung, Ukjin, Choi, Minhyuck, Park, Junekyun, Shin, Sangchul, Pae, Sangwoo |
| المصدر: |
2018 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2018 IEEE International. :4A.4-1-4A.4-4 Mar, 2018 |
| Relation: |
2018 IEEE International Reliability Physics Symposium (IRPS) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
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