مؤتمر
Benefits of a thermal drift during atomic layer deposition of Al2O3 for C-Si passivation
العنوان: | Benefits of a thermal drift during atomic layer deposition of Al2O3 for C-Si passivation |
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المؤلفون: | Lebreton, Fabien, Zauner, Andy, Bulkin, Pavel, Silva, Francois, Filonovich, Sergej, i Cabarrocas, Pere Roca |
المصدر: | 2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) Photovoltaic Specialist Conference (PVSC), 2017 IEEE 44th. :1237-1240 Jun, 2017 |
Relation: | 2017 IEEE 44th Photovoltaic Specialists Conference (PVSC) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781509056057 |
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DOI: | 10.1109/PVSC.2017.8366269 |