Comprehensive 3D TSV Reliability Study on 14nm FINFET Technology with Thinned Wafers

التفاصيل البيبلوغرافية
العنوان: Comprehensive 3D TSV Reliability Study on 14nm FINFET Technology with Thinned Wafers
المؤلفون: Premachandran, C.S., Cimino, Salvatore, Ogdan, Sean, Wu, Zhuo-Jie, Smith, Daniel, Kannan, Sukesh, Cao, Linjun, Prabhu, Manjunatha, Yao, Walter, Ranjan, Rakesh, England, Luke, Justison, Patrick
المصدر: 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM) Electron Devices Technology and Manufacturing Conference (EDTM), 2018 IEEE 2nd. :37-40 Mar, 2018
Relation: 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM)
قاعدة البيانات: IEEE Xplore Digital Library