دورية أكاديمية
Novel capacitor process using diffusion barrier rounded by Si3N4 spacer for high density FRAM device
| العنوان: | Novel capacitor process using diffusion barrier rounded by Si3N4 spacer for high density FRAM device |
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| المؤلفون: | Bon Jae Koo, Yoon Jong Song, Sung Yung Lee, Dong Jin Jung, Hyun Ho Kim, Suk Ho Joo, Yong Tak Lee, Kinam Kim |
| المصدر: | IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 21(6):280-282 Jun, 2000 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 07413106 15580563 |
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| DOI: | 10.1109/55.843150 |