Intel 22nm FinFET (22FFL) Process Technology for RF and mm Wave Applications and Circuit Design Optimization for FinFET Technology

التفاصيل البيبلوغرافية
العنوان:	Intel 22nm FinFET (22FFL) Process Technology for RF and mm Wave Applications and Circuit Design Optimization for FinFET Technology
المؤلفون:	Lee, H.-J., Rami, S., Ravikumar, S., Neeli, V., Phoa, K., Sell, B., Zhang, Y.
المصدر:	2018 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2018 IEEE International. :14.1.1-14.1.4 Dec, 2018
Relation:	2018 IEEE International Electron Devices Meeting (IEDM)
قاعدة البيانات:	IEEE Xplore Digital Library