Localized Layout Effect Related Reliability Approach in 8nm FinFETs Technology: From Transistor to Circuit

التفاصيل البيبلوغرافية
العنوان: Localized Layout Effect Related Reliability Approach in 8nm FinFETs Technology: From Transistor to Circuit
المؤلفون: Jiang, Hai, Sagong, Hyunchul, Kim, Jinju, Park, Junekyun, Shin, Sangchul, Pae, Sangwoo
المصدر: 2019 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2019 IEEE International. :1-5 Mar, 2019
Relation: 2019 IEEE International Reliability Physics Symposium (IRPS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781538695043
تدمد:19381891
DOI:10.1109/IRPS.2019.8720409