مؤتمر
Change of Depth Profile for High-Temperature Implantation in Channeling Condition
| العنوان: | Change of Depth Profile for High-Temperature Implantation in Channeling Condition |
|---|---|
| المؤلفون: | Sano, Makoto, Sasaki, Haruka, Kawasaki, Yoji, Sugitani, Michiro |
| المصدر: | 2018 22nd International Conference on Ion Implantation Technology (IIT) Ion Implantation Technology (IIT), 2018 22nd International Conference on. :62-65 Sep, 2018 |
| Relation: | 2018 22nd International Conference on Ion Implantation Technology (IIT) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
| ردمك: | 9781538668283 9781538668290 9781538668276 |
|---|---|
| DOI: | 10.1109/IIT.2018.8807902 |