Thickness Variance of Silicon Oxide with Nitrogen Ion Implant

التفاصيل البيبلوغرافية
العنوان: Thickness Variance of Silicon Oxide with Nitrogen Ion Implant
المؤلفون: Ishibashi, Kazuhisa, Kawasaki, Yoji, Ninomiya, Shiro, Sugitani, Michiro
المصدر: 2018 22nd International Conference on Ion Implantation Technology (IIT) Ion Implantation Technology (IIT), 2018 22nd International Conference on. :140-143 Sep, 2018
Relation: 2018 22nd International Conference on Ion Implantation Technology (IIT)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781538668283
9781538668290
9781538668276
DOI:10.1109/IIT.2018.8807940