Advantages and Challenges of Plasma Immersion Ion Implantation for Power Devices Manufacturing on Si, SiC and GaN using PULSION® Tool

التفاصيل البيبلوغرافية
العنوان: Advantages and Challenges of Plasma Immersion Ion Implantation for Power Devices Manufacturing on Si, SiC and GaN using PULSION® Tool
المؤلفون: Torregrosa, Frank, Spiegel, Yohann, Roux, Laurent, Sempere, Guillaume, Borvon, Gael, Wuebben, Thomas, Schustereder, Werner, Jelinek, Moriz, Morancho, Frederic, Godignon, Philippe, Zielinski, Marcin
المصدر: 2018 22nd International Conference on Ion Implantation Technology (IIT) Ion Implantation Technology (IIT), 2018 22nd International Conference on. :33-37 Sep, 2018
Relation: 2018 22nd International Conference on Ion Implantation Technology (IIT)
قاعدة البيانات: IEEE Xplore Digital Library