Novel high drain breakdown voltage AlGaN/GaN HFETs using selective thermal oxidation process

التفاصيل البيبلوغرافية
العنوان: Novel high drain breakdown voltage AlGaN/GaN HFETs using selective thermal oxidation process
المؤلفون: Masato, H., Ikeda, Y., Matsuno, T., Inoue, K., Nishii, K.
المصدر: International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) Electron devices meeting Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International. :377-380 2000
Relation: International Electron Devices Meeting. Technical Digest. IEDM
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780364384
9780780364387
DOI:10.1109/IEDM.2000.904335