Dielectric Reliability Study of 21 nm Pitch Interconnects with Barrierless Ru Fill

التفاصيل البيبلوغرافية
العنوان: Dielectric Reliability Study of 21 nm Pitch Interconnects with Barrierless Ru Fill
المؤلفون: Lesniewska, A., Roussel, P.J., Tierno, D., Gonzalez, V. Vega, van der Veen, M. H., Verdonck, P., Jourdan, N., Wilson, C.J., Tokei, Zs., Croes, K.
المصدر: 2020 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2020 IEEE International. :1-6 Apr, 2020
Relation: 2020 IEEE International Reliability Physics Symposium (IRPS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781728131993
تدمد:19381891
DOI:10.1109/IRPS45951.2020.9129246