مؤتمر
Evaluation of tests to examine charging damage in ion implantation and plasma processes: using controlled stress environments
| العنوان: | Evaluation of tests to examine charging damage in ion implantation and plasma processes: using controlled stress environments |
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| المؤلفون: | Goeckner, M.J., Felch, S.B., Weeman, J., Erhardt, J. |
| المصدر: | 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) Ion implantation technology Ion Implantation Technology, 2000. Conference on. :596-599 2000 |
| Relation: | 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780364627 9780780364622 |
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| DOI: | 10.1109/IIT.2000.924223 |