Molecular Dynamics Study on Sub-Nanoscale Removal Mechanism of 3C-SIC in a Fixed Abrasive Polishing

التفاصيل البيبلوغرافية
العنوان: Molecular Dynamics Study on Sub-Nanoscale Removal Mechanism of 3C-SIC in a Fixed Abrasive Polishing
المؤلفون: Zhou, Piao, Zhu, Yongwei, Sun, Tao
المصدر: 2020 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2020 China. :1-4 Jun, 2020
Relation: 2020 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781728165585
DOI:10.1109/CSTIC49141.2020.9282578