التفاصيل البيبلوغرافية
| العنوان: |
Process Optimization of Trench Field Plate Power MOSFETs with Sequential Phosphorus-Doped Silicon |
| المؤلفون: |
Tomita, Kota, Shiraishi, Tatsuya, Kato, Hiroaki, Kishimoto, Hiroyuki, Miyashita, Katsura, Kobayashi, Kenya |
| المصدر: |
2020 International Symposium on Semiconductor Manufacturing (ISSM) Semiconductor Manufacturing (ISSM, 2020 International Symposium on. :1-4 Dec, 2020 |
| Relation: |
2020 International Symposium on Semiconductor Manufacturing (ISSM) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
