One-step TSV process development for 4-layer wafer stacked DRAM

التفاصيل البيبلوغرافية
العنوان: One-step TSV process development for 4-layer wafer stacked DRAM
المؤلفون: Kawano, Masaya, Wang, Xiang-Yu, Ren, Qin, Loh, Woon-Leng, Rao, BSS. Chandra, Chui, King-Jien
المصدر: 2021 IEEE 71st Electronic Components and Technology Conference (ECTC) ECTC Electronic Components and Technology Conference (ECTC), 2021 IEEE 71st. :673-679 Jun, 2021
Relation: 2021 IEEE 71st Electronic Components and Technology Conference (ECTC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665440974
تدمد:23775726
DOI:10.1109/ECTC32696.2021.00117