Low Resistivity Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition on Silicon

التفاصيل البيبلوغرافية
العنوان: Low Resistivity Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition on Silicon
المؤلفون: Kuo, Cheng-hsuan, Wang, Victor, Zhang, Zichen, Spiegelman, Jeffrey, Alvarez, Daniel, Kummel, Andrew C., Yun, SeongUK, Simka, Harsono
المصدر: 2021 IEEE International Interconnect Technology Conference (IITC) Interconnect Technology Conference (IITC), 2021 IEEE International. :1-3 Jul, 2021
Relation: 2021 IEEE International Interconnect Technology Conference (IITC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781728176321
تدمد:23806338
DOI:10.1109/IITC51362.2021.9537463