مؤتمر
In-situ CMP copper endpoint control system
| العنوان: | In-situ CMP copper endpoint control system |
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| المؤلفون: | Allen, R., Chen, C., Trikas, T., Lehman, K., Shinagawa, R., Bhaskaran, V., Stephenson, B., Watts, D. |
| المصدر: | 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) Semiconductor manufacturing Semiconductor Manufacturing Symposium, 2001 IEEE International. :391-394 2001 |
| Relation: | 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780367316 9780780367319 |
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| DOI: | 10.1109/ISSM.2001.962997 |