SiN/in-situ-GaON Staggered Gate Stack on p-GaN for Enhanced Stability in Buried-Channel GaN p-FETs

التفاصيل البيبلوغرافية
العنوان: SiN/in-situ-GaON Staggered Gate Stack on p-GaN for Enhanced Stability in Buried-Channel GaN p-FETs
المؤلفون: Zhang, Li, Zheng, Zheyang, Cheng, Yan, Ng, Yat Hon, Feng, Sirui, Song, Wenjie, Chen, Tao, Chen, Kevin J.
المصدر: 2021 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2021 IEEE International. :5.3.1-5.3.4 Dec, 2021
Relation: 2021 IEEE International Electron Devices Meeting (IEDM)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665425728
تدمد:2156017X
DOI:10.1109/IEDM19574.2021.9720653