دورية أكاديمية
High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings
| العنوان: | High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings |
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| المؤلفون: | Günther, Steffen, Fahland, Matthias, Fahlteich, John, Meyer, Björn, Straach, Steffen, Schiller, Nicolas |
| المصدر: | In Thin Solid Films 1 April 2013 532:44-49 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 00406090 |
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| DOI: | 10.1016/j.tsf.2012.11.150 |