دورية أكاديمية
Low-oxygen silicon preparation using vacuum treatment by oxidation control and moisture removal kinetics investigation
| العنوان: | Low-oxygen silicon preparation using vacuum treatment by oxidation control and moisture removal kinetics investigation |
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| المؤلفون: | Han, Shifeng, Yang, Shicong, Wei, Kuixian, Ma, Wenhui, Zhang, Jianqiang |
| المصدر: | In Vacuum September 2024 227 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 0042207X |
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| DOI: | 10.1016/j.vacuum.2024.113410 |