دورية أكاديمية
Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process
| العنوان: | Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process |
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| المؤلفون: | Ee, Y.C. *, Chen, Z., Wang, W.D., Chi, D.Z., Xu, S., Law, S.B. |
| المصدر: | In Surface & Coatings Technology 2005 198(1):291-295 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 02578972 |
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| DOI: | 10.1016/j.surfcoat.2004.10.105 |