دورية أكاديمية
Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2 films deposited by ALD: A DFT study
| العنوان: | Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2 films deposited by ALD: A DFT study |
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| المؤلفون: | Cortez-Valadez, M., Fierro, C., Farias-Mancilla, J.R., Vargas-Ortiz, A., Flores-Acosta, M., Ramírez-Bon, R., Enriquez-Carrejo, J.L., Soubervielle-Montalvo, C., Mani-Gonzalez, P.G. |
| المصدر: | In Chemical Physics 15 June 2016 472:81-88 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 03010104 |
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| DOI: | 10.1016/j.chemphys.2016.03.008 |