دورية أكاديمية
Boron activation in silicon thin films grown by PECVD under epitaxial and microcrystalline conditions
| العنوان: | Boron activation in silicon thin films grown by PECVD under epitaxial and microcrystalline conditions |
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| المؤلفون: | Olivares, Antonio J., Zamchiy, A., Nguyen, V.S., Roca i Cabarrocas, P. |
| المصدر: | In Applied Surface Science Advances December 2023 18 |
| قاعدة البيانات: | ScienceDirect |
Full Text Finder | تدمد: | 26665239 |
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| DOI: | 10.1016/j.apsadv.2023.100508 |