دورية أكاديمية
Control of self-assembly of lithographically patternable block copolymer films.
| العنوان: | Control of self-assembly of lithographically patternable block copolymer films. |
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| المؤلفون: | Bosworth JK; Department of Materials Science and Engineering, Bard Hall, Cornell University, Ithaca, New York 14853, USA., Paik MY, Ruiz R, Schwartz EL, Huang JQ, Ko AW, Smilgies DM, Black CT, Ober CK |
| المصدر: | ACS nano [ACS Nano] 2008 Jul; Vol. 2 (7), pp. 1396-402. |
| نوع المنشور: | Journal Article; Research Support, N.I.H., Extramural; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S. |
| اللغة: | English |
| بيانات الدورية: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE |
| أسماء مطبوعة: | Original Publication: Washington D.C. : American Chemical Society |
| مواضيع طبية MeSH: | Membranes, Artificial*, Crystallization/*methods , Nanostructures/*chemistry , Nanostructures/*ultrastructure , Nanotechnology/*methods , Polystyrenes/*chemistry, Macromolecular Substances/chemistry ; Materials Testing ; Molecular Conformation ; Particle Size ; Surface Properties |
| مستخلص: | Poly(alpha-methylstyrene)-block-poly(4-hydroxystyrene) acts as both a lithographic deep UV photoresist and a self-assembling material, making it ideal for patterning simultaneously by both top-down and bottom-up fabrication methods. Solvent vapor annealing improves the quality of the self-assembled patterns in this material without compromising its ability to function as a photoresist. The choice of solvent used for annealing allows for control of the self-assembled pattern morphology. Annealing in a nonselective solvent (tetrahydrofuran) results in parallel orientation of cylindrical domains, while a selective solvent (acetone) leads to formation of a trapped spherical morphology. Finally, we have self-assembled both cylindrical and spherical phases within lithographically patterned features, demonstrating the ability to precisely control ordering. Observing the time evolution of switching from cylindrical to spherical morphology within these features provides clues to the mechanism of ordering by selective solvent. |
| المشرفين على المادة: | 0 (Macromolecular Substances) 0 (Membranes, Artificial) 0 (Polystyrenes) |
| تواريخ الأحداث: | Date Created: 20090212 Date Completed: 20090320 Latest Revision: 20090211 |
| رمز التحديث: | 20240628 |
| DOI: | 10.1021/nn8001505 |
| PMID: | 19206307 |
| قاعدة البيانات: | MEDLINE |
Find this issue from the American Chemical Society | تدمد: | 1936-086X |
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| DOI: | 10.1021/nn8001505 |