التفاصيل البيبلوغرافية
| العنوان: |
Direct formation of ZnO nanostructures by chemical solution deposition and EUV exposure. |
| المؤلفون: |
Auzelyte V; Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland. vaida.auzelyte@epfl.ch, Sigg H, Schmitt B, Solak HH |
| المصدر: |
Nanotechnology [Nanotechnology] 2010 May 28; Vol. 21 (21), pp. 215302. Date of Electronic Publication: 2010 Apr 30. |
| نوع المنشور: |
Journal Article |
| اللغة: |
English |
| بيانات الدورية: |
Publisher: IOP Pub Country of Publication: England NLM ID: 101241272 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1361-6528 (Electronic) Linking ISSN: 09574484 NLM ISO Abbreviation: Nanotechnology Subsets: PubMed not MEDLINE |
| أسماء مطبوعة: |
Original Publication: Bristol, UK : IOP Pub., c1990- |
| مستخلص: |
The development of effective methods for the fabrication of ZnO nanostructures is important for the use of this semiconductor material with interesting optical and electronic properties. Chemical solution deposition methods have been demonstrated for creating ZnO films and electron beam exposure of a precursor film, zinc naphthenate, has been shown to yield ZnO nanostructures. Here, we report on the fabrication of ZnO nanostructures with photon beam exposure of a precursor film in the extreme ultraviolet range followed by a high temperature anneal in air. Interference lithography at this wavelength (13.5 nm) led to the production of extremely smooth line/space and dot array type periodic nanostructures with sizes as small as 10 nm. ZnO films obtained through EUV exposure exhibit markedly improved PL spectra with a sharp emission line in the UV range and much suppressed green emission. Electron microscopy and x-ray diffraction measurements also show strong effects of the EUV exposure step in ZnO formation as a function of precursor film thickness, EUV exposure dose and anneal temperature. The use of energetic photons for direct formation of ZnO nanostructures is found to be a method that warrants more investigation for the fabrication of patterned ZnO films with controlled properties. |
| تواريخ الأحداث: |
Date Created: 20100501 Date Completed: 20100728 Latest Revision: 20100430 |
| رمز التحديث: |
20231215 |
| DOI: |
10.1088/0957-4484/21/21/215302 |
| PMID: |
20431188 |
| قاعدة البيانات: |
MEDLINE |
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