دورية أكاديمية
أعرض في EDS

Characteristics of inorganic acid emission from various generation semiconductor manufacturing factories.

التفاصيل البيبلوغرافية
العنوان: Characteristics of inorganic acid emission from various generation semiconductor manufacturing factories.
المؤلفون: Yeh MP; Environmental Lab., Taiwan Semiconductor Manufacturing Company, Ltd., Taichung, 407, Taiwan., Wu LF; Facility Division, Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, 300, Taiwan., Fan ET; Facility Division, Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, 300, Taiwan., Chen T; Facility Division, Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, 300, Taiwan., Chuang TS; Facility Division, Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, 300, Taiwan., Lee SL; Department of Chemical Engineering, National Taiwan University, Taipei, 106, Taiwan., Tung KL; Facility Division, Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, 300, Taiwan; Department of Chemical Engineering, National Taiwan University, Taipei, 106, Taiwan. Electronic address: kltung@tsmc.com.
المصدر: Chemosphere [Chemosphere] 2024 Jan; Vol. 347, pp. 140745. Date of Electronic Publication: 2023 Nov 17.
نوع المنشور: Journal Article
اللغة: English
بيانات الدورية: Publisher: Elsevier Science Ltd Country of Publication: England NLM ID: 0320657 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1879-1298 (Electronic) Linking ISSN: 00456535 NLM ISO Abbreviation: Chemosphere Subsets: MEDLINE
أسماء مطبوعة: Publication: Oxford : Elsevier Science Ltd
Original Publication: Oxford, New York, : Pergamon Press.
مواضيع طبية MeSH: Air Pollutants*/analysis , Air Pollution*/analysis , Environmental Pollutants*, Vehicle Emissions/analysis ; Acids ; Manufacturing and Industrial Facilities ; Semiconductors ; Environmental Monitoring
مستخلص: With advancements in semiconductor industry technology, the gas emissions per wafer have decreased, but the emission compositions have shown significant differences. This study analyzed nine semiconductor plants representing different generations of process technologies, ranging from 3 μm to 12 nm technology nodes. Stack inspections were conducted on the acid, alkali, and organic exhaust systems to understand the characteristics of inorganic acid emissions in plants in different process technologies. The analysis showed that with technological process and air pollution control equipment advancements, the emissions of inorganic acids per wafer decreased by 38% compared to the first generation. It is worth noting that both hydrofluoric acid and nitric acid are identified as the primary pollutants in traditional semiconductor process plants. At the same time, H 2 SO 4 was instead the primary pollutant in advanced process plants. Based on these characteristics, each plant has established relevant improvement strategies. After two years of improvement, the emissions of inorganic acids per wafer in each generation of plants are evidenced to have further decreased by 15-56%. Hence, it is shown that these initiatives and studies have successfully helped to reduce air pollution emissions and promote advanced green manufacturing.
Competing Interests: Declaration of competing interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.
(Copyright © 2023 Elsevier Ltd. All rights reserved.)
فهرسة مساهمة: Keywords: Air pollution prevention and control; Exhaust gas composition in the stack; Inorganic acid emission; Semiconductor manufacturing emission
المشرفين على المادة: 0 (Air Pollutants)
0 (Vehicle Emissions)
0 (Acids)
0 (Environmental Pollutants)
تواريخ الأحداث: Date Created: 20231119 Date Completed: 20231206 Latest Revision: 20231206
رمز التحديث: 20231206
DOI: 10.1016/j.chemosphere.2023.140745
PMID: 37981016
قاعدة البيانات: MEDLINE
الوصف
تدمد:1879-1298
DOI:10.1016/j.chemosphere.2023.140745