مؤتمر
SIMULATION OF HYDROGENATED SILICON ION CLUSTER FORMATION DURING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION.
| العنوان: | SIMULATION OF HYDROGENATED SILICON ION CLUSTER FORMATION DURING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION. |
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| المؤلفون: | STEKOLNIKOV, A. F., FESHCHENKO, D. V., IVANOV, O. M., SERGEANTOV, A. S. |
| المصدر: | Physics, Chemistry & Application of Nanostructures: Reviews & Short Notes To Nanomeeting '99; 1999, p255-258, 4p |
| مصطلحات موضوعية: | GAS phase reactions, NANOPARTICLES, CHEMICAL vapor deposition, GLOW discharges, ANIONS |
| قاعدة البيانات: | Complementary Index |
| ردمك: | 9789810238896 |
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