مؤتمر
Advanced combined overlay and CD uniformity measurement mark for double patterning.
| العنوان: | Advanced combined overlay and CD uniformity measurement mark for double patterning. |
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| المؤلفون: | Hsiao Lin Hsu, En Chuan Lio, Chen, Charlie, Jia Hung Chang, Sho Shen Lee, Buhl, Stefan, Gutsch, Manuela, Lomtscher, Patrick, Freitag, Martin, Habets, Boris, Liu, Rex |
| المصدر: | Proceedings of SPIE; 2018, Vol. 10585, p1-17, 17p |
| قاعدة البيانات: | Complementary Index |
| تدمد: | 0277786X |
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| DOI: | 10.1117/12.2299299 |