دورية أكاديمية

Analysis of Adverse Reactions of Cosmetics in Chinese Han Population in Recent Five Years.

التفاصيل البيبلوغرافية
العنوان: Analysis of Adverse Reactions of Cosmetics in Chinese Han Population in Recent Five Years.
المؤلفون: Dong, Canbin, Liu, Fang, Liao, Zuda, Lin, Lanmei, Wang, Runnan, Du, Juan, Huang, Wen
المصدر: Clinical, Cosmetic & Investigational Dermatology; Sep2023, Vol. 16, p2419-2428, 10p
مصطلحات موضوعية: CHINESE people, COSMETICS, CONTACT dermatitis, LOGISTIC regression analysis, PROPYLENE glycols
مستخلص: The aim of this study is to summarize and analyze the occurrence of cosmetic adverse reactions in Shanghai Han population by using available survey data.Materials and Methods: Collection, statistics and analysis of patients with cosmetic adverse reactions in Shanghai Huashan Hospital from 2017 to 2021.Results: Among the 1004 patients, most of them (96.71%) were diagnosed as cosmetic contact dermatitis, which often occurred within 3 days of using cosmetics (51.79%). A total of 260 patients were tested with patch test, but the compliance rate was only 18.08%. Among them, 240 patients underwent additional European standard allergen tests, and positive allergens were detected in 210 cases (87.5%). Univariate analysis revealed that dosage form (emulsion and cream), age (≤ 25 years) and the allergic ingredients triethanolamine, rose oil, propylene glycol, thiomersal and musk ambrette are associated with the occurrence of cosmetic adverse reactions within seven days. A logit prediction model was also successfully constructed: Logit (P) = 1.710– 0.796× 1 + 1.185× 2 − 3.650X3-1.335X4.Conclusion: This study complements the data reported on cosmetic adverse reactions in the Chinese Han population and suggests that in future clinical diagnosis and data collection, emphasis should be placed on patch testing, combining the patch test with cosmetic protoplast with the European standard allergen test to improve the detection rate. [ABSTRACT FROM AUTHOR]
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قاعدة البيانات: Complementary Index
الوصف
تدمد:11787015
DOI:10.2147/CCID.S418591