دورية أكاديمية

Effect of surface morphology of Ni thin film on the growth of aligned carbon nanotubes by microwave plasma-enhanced chemical vapor deposition.

التفاصيل البيبلوغرافية
العنوان: Effect of surface morphology of Ni thin film on the growth of aligned carbon nanotubes by microwave plasma-enhanced chemical vapor deposition.
المؤلفون: Young Chul Choi, Young Min Shin, Seong Chu Lim, Dong Jae Bae, Young Hee Lee, Byung Soo Lee, Dong-Chul Chung
المصدر: Journal of Applied Physics; 10/15/2000, Vol. 88 Issue 8, p4898, 6p, 5 Black and White Photographs, 1 Diagram, 2 Graphs
مصطلحات موضوعية: THIN films, SILICON compounds, CARBON compounds, PLASMA-enhanced chemical vapor deposition
مستخلص: Focuses on the synthesis of aligned carbon nanotubes on nickel-coated Si substrates using microwave plasma-enhanced chemical vapor deposition. Variability of the surface morphology of the nickel thin films; Influence of the surface morphology of the films on the growth of the carbon nanotubules; Synthesis of pure carbon nanotubes on thin films.
قاعدة البيانات: Complementary Index
الوصف
تدمد:00218979
DOI:10.1063/1.1314614