التفاصيل البيبلوغرافية
| العنوان: |
Use of ultrathin oxides and thin polycrystalline silicon films for stable high-efficiency... |
| المؤلفون: |
Gruenbaum, P.E., Gan, J.Y., Swanson, R.M. |
| المصدر: |
Applied Physics Letters; 3/4/1991, Vol. 58 Issue 9, p945, 3p, 3 Graphs |
| مصطلحات موضوعية: |
POLYCRYSTALLINE semiconductors, SILICON, ULTRAVIOLET spectra |
| مستخلص: |
Examines the ultraviolet stability of ultrathin oxides covered by a thin polycrystalline silicon film and a thick oxide. Excellence of the antireflection properties of the oxide/polycrystalline silicon/oxide stacks which offset the absorption losses from the polycrystalline silicon; Stability of stacks under ultraviolet exposure. |
| قاعدة البيانات: |
Complementary Index |
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