مؤتمر
Extension of 248-nm optical lithography: a thin film imaging approach.
| العنوان: | Extension of 248-nm optical lithography: a thin film imaging approach. |
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| المؤلفون: | Lin, Qinghuang, Katnani, Ahmad D., Brunner, Timothy A., DeWan, Charlotte, Fairchok, Cindy, LaTulipe, Douglas C., Simons, John P., Petrillo, Karen E., Babich, Katherina, Seeger, David E., Angelopoulos, Marie, Sooriyakumaran, Ratnam, Wallraff, Gregory M., Hofer, Donald C. |
| المصدر: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p278-288, 11p |
| قاعدة البيانات: | Complementary Index |
| تدمد: | 0277786X |
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| DOI: | 10.1117/12.312417 |