مؤتمر
Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique.
| العنوان: | Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique. |
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| المؤلفون: | Jeon, Young-Doo, Jun, Sungho, Kang, Jae-Hyun, Lee, Sang-Uk, Kim, Jeahee, Kim, Keeho |
| المصدر: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65183W-65183W-8, 8p |
| قاعدة البيانات: | Complementary Index |
| تدمد: | 0277786X |
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| DOI: | 10.1117/12.712016 |