New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices.

التفاصيل البيبلوغرافية
العنوان: New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices.
المؤلفون: Conley, Will, Brunsvold, William R., Buehrer, Fred, DellaGuardia, Ronald, Dobuzinsky, David, Farrell, Timothy R., Ho, Hok, Katnani, Ahmad D., Keller, Robin, Marsh, James T., Muller, Paul, Nunes, Ronald, Ng, Hung Y., Oberschmidt, James M., Pike, Michael, Ryan, Deborah, Cotler-Wagner, Tina, Schulz, Ron, Ito, Hiroshi, Hofer, Donald C.
المصدر: Proceedings of SPIE; Nov1997, Issue 1, p282-299, 18p
قاعدة البيانات: Complementary Index
الوصف
تدمد:0277786X
DOI:10.1117/12.275830